DOI: 10.1039/d3nr04420c ISSN: 2040-3364
A novel atomic removal model for chemical mechanical polishing using developed mesoporous shell/core abrasives based on molecular dynamics
Zhensong Liu, Zhenyu Zhang, Junyuan Feng, Xian Yi, Chunjing Shi, Yang Gu, Feng Zhao, Shihao Liu, Jingru Li- General Materials Science
Mesoporous shell/core silica abrasives were prepared, and a novel green CMP slurry was developed, including sorbitol, hydrogen peroxide and sodium carbonate.