Surface Textures on Nonplanar Surfaces Fabricated via Modified Soft Lithography and Electrochemical Etching
Yunfang Wan, Maomi Zhao, Jing Xiang, Yufei Mo, Zihan Pan, Qixin Tian, Alicia ChauThree‐dimensional surface textures on nonplanar surfaces are increasingly important for optical, electronic, biomedical, and mechanical applications. Traditional microfabrication methods, based on photolithography and dry/wet etching processes, were originally developed for planar surfaces. This article introduces a novel photolithographic technique that employs a large‐size soft mask to fabricate surface textures onto curved metal surfaces. A soft lithography mask was successfully developed by transferring master patterns onto an elastomeric polymer film, which serves as the soft mask. The soft mask was then directly applied to a curved or other complex‐shaped surface for the photolithography process, followed by electrochemical etching. It has been confirmed that the fabricated soft mask can reproduce the master pattern on a curved surface with controlled texture feature shapes and dimensions. As an illustration of potential applications, the tribological behavior of the textured sample was investigated using reciprocating friction testing. Compared to untextured samples, testing results demonstrated friction reduction and potential energy savings with samples textured using the soft mask technique.