SputterOne: A Physics‐Informed Interactive Magnetron Sputtering Simulator Enabling a Process Digital Twin

ABSTRACT

Magnetron sputtering is one of the most widely used physical vapor deposition techniques, yet systematic process optimization remains challenging it typically demands extensive physical experimentation or computationally intensive particle‐in‐cell, fluid, or Monte Carlo simulations. SputterOne is a browser‐based physics‐informed interactive simulation platform for real‐time exploration of magnetron sputtering process conditions without installation or specialist software. The platform integrates the Yamamura–Bohdansky sputtering yield formulation, kinetic‐theory mean free path transport, Berg‐framework reactive sputtering hysteresis, co‐sputtering composition estimation, and Bauer‐scheme growth mode classification. Vacuum processing conditions and an integrated process advisory module are incorporated through simplified formulations. Sputtering yield predictions agree with Yamamura–Tawara reference values within experimental scatter across nine targets, and pressure‐dependent transport reproduces deposition‐rate attenuation consistent with established thin‐film models. Reactive sputtering hysteresis is reproduced qualitatively for Ar/ conditions. Experimental validation against Cu thin films on Si(100) confirms qualitative pressure‐dependent transport trend reproduction; the parametric discharge model does not couple plasma density to working pressure and does not reproduce the experimentally observed rate increase with pressure, a limitation acknowledged in the Supplementary Material. All modules run at interactive frame rates in a standard web browser, making SputterOne a practical tool for process pre‐screening, parameter exploration, and thin‐film deposition research.