Review of Nanoscale Precision Shape and Property Control Manufacturing Technology for Monocrystalline Silicon

Monocrystalline silicon, with its high refractive index, high infrared transmittance, and excellent dimensional stability, serves as a key optical component in high-energy laser systems, infrared imaging, and guidance fields. Its processing quality directly affects the performance indicators of related systems. To address the challenges of nanoscale precision shape and property control during processing, methods such as ultra-precision cutting, magnetorheological polishing, laser micromachining, ion beam processing, plasma etching, and chemical–mechanical polishing have been adopted to improve the surface shape accuracy and repair defects of monocrystalline silicon components. This paper reviews the research progress of key technologies, including nanoscale precision surface shape control manufacturing technology, nanoscale precision property control generation methods, and combined processes for its nanoscale shape and property control, providing technical support for achieving nanoscale precision shape and property control manufacturing of monocrystalline silicon components.