DOI: 10.1039/d6nr00545d ISSN: 2040-3364
Material removal mechanism elucidated by a novel cross-scale model using a unified physical framework linking macroscopic stress distribution and microscopic motion states of abrasives for polishing
Yiran Li, Zhenyu Zhang, Bin Yang, Fuzhen Xuan, Yanxun Xiang, Bowei Zhang, Jiaxin Yu, Xingqiao Deng, Zhenghong LiuPolishing setup and three kinds of polishing pads with different microstructures for non-woven fabric, polyurethane and pitch pads.