DOI: 10.1039/d6ta03851d ISSN: 2050-7488
Highly compact and thick tellurium film deposition for thermoelectric application
Linhan Wang, Heiko Reith, Javier Garcia Fernandez, Cong Li, Heike Schloerb, Ruben Hühne, Wenjie Liang, Gabi Schierning, Guodong Li, Kornelius NielschA two-step pulsed electrodeposition method yields compact, continuous tellurium thick films with exceptional Seebeck coefficient and a peak power factor of 6.62 µW cm −1 K −2 .