DOI: 10.1039/d6ta03808e ISSN: 2050-7488

High-throughput screening of alucone and zincone photoresists through molecular layer deposition

Duncan J. Reece, Emily R. Crum, Jane Keth, David S. Bergsman

High-throughput molecular layer deposition screened twelve metal–organic chemistries; the alkyne-linked alucone that emerged resolves 20 nm half-pitch line/space patterns by 100 kV electron-beam lithography in dilute HCl developer.

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