High-Resolution Multicolor Photolithographic Patterning of Solution-Processed Light-Emitting Semiconductors
Rui Gao, Qingqing Lu, Lubing Bai, Xiaoqi Guo, Qixin Du, Yuhao Miao, Mengyuan Li, Dongyang Zheng, Qiang Gao, Liyan Sun, Jiabin Liu, Yue Zhang, Chuanxin Wei, Xiang An, Yamin Han, Linghai Xie, Jinyi Lin, Wei HuangAbstract
Achieving high-resolution, multicolor patterns with solution-processable light-emitting semiconductors is essential for advancing flexible displays. Herein, we report a versatile photo-crosslinker featuring triphenylamine as the core and azide as the functional group, which enables high-resolution micropatterning of light-emitting conjugated polymers and quantum dots through UV-triggered cross-linking with alkyl side chains. Owing to the excellent solvent resistance of UV-exposed regions, well-defined multicolor patterns with feature sizes as small as 5 μm and a resolution exceeding 1600 pixels per inch (ppi) can be readily achieved through direct photolithography at low cross-linker loadings (1−5 wt %). More importantly, benefiting from the remarkable compatibility of this cross-linker with light-emitting semiconductors, their emission color and spectral characteristics are well preserved despite the inevitable performance trade-off, as evidenced by photophysical and electroluminescent characterization. This study provides a versatile material strategy toward the scalable fabrication of high-resolution, multicolor flexible displays and integrated optoelectronics through solution-processing techniques.