DOI: 10.1039/d6nr02031c ISSN: 2040-3364
High-resolution dual-layer two-photon lithography for nanoscale patterning
Chenran Zhang, Yun-Lu Sun, Zifeng Xiao, Xiuzhen Xu, Xiaobin XuA dual-layer two-photon lithography (DL-TPL) strategy combining positive and negative photoresists achieves 99 nm resolution in a single maskless, vacuum-free exposure, outperforming conventional TPL and other bilayer methods.