Graphitic Carbon Nitride-Based Materials for PMS-Assisted Visible-Light Photocatalytic Degradation of Antibiotics: Synthesis, Mechanisms, and Future Perspectives

The rapid increase in antibiotic resistance has driven growing interest in advanced photocatalytic materials for the effective removal of antibiotic pollutants from wastewater systems. Among these materials, graphitic carbon nitride (g-C3N4), a metal-free polymeric semiconductor, has emerged as a sustainable and efficient photocatalyst due to its strong visible-light activity, excellent chemical stability, and tunable electronic properties. This review presents a comprehensive overview of recent advances in the synthesis of g-C3N4-based materials for peroxymonosulfate (PMS)-assisted visible-light-driven photocatalytic degradation of antibiotics. The antibiotics discussed in this review include tetracycline, ciprofloxacin, levofloxacin, sulfamethoxazole, sulfamethazine, doxycycline, oxytetracycline, and moxifloxacin, along with other pharmaceutical contaminants. The fundamental degradation mechanisms, including the generation of reactive oxygen species (ROS), PMS activation pathways, and interfacial charge-transfer processes, are systematically discussed. Furthermore, this review addresses factors influencing photocatalytic performance, including photocatalyst dosage, solution pH, temperature, pollutant concentration, and light intensity. Finally, the current challenges and future perspectives for the practical application of g-C3N4-based materials in wastewater treatment are highlighted.