DOI: 10.1039/d6mh02024k ISSN: 2051-6347

Controlled exposure of Ti–O-related sites in a dual-ligand Ti-based MOF heterostructure via alkaline etching for ultrafast Cs + and Sr

Haixiang Tang, Xiuyi Bai, Bingxin Xue, Xinpeng Wang, Nannan Wang, Yanqiu Zhu

In situ exposure of active clusters in dual-ligand Ti-based MOFs via alkaline etching for ultrafast and highly efficient capture of Cs + and Sr 2+ .

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