DOI: 10.1021/acsnano.6c15481 ISSN: 1936-0851

Cation-Intercalated Mott Insulator α-RuCl3 Superlattice for Actively Tuned Optoelectronics

Ran Tang, Daozhi Shen, Linglan Guo, Qiaolin Gu, Xinyue Li, Dingyun Zhang, Yufan Mao, Feifan Wang, Mingjun Ren, Xinquan Zhang, Limin Zhu, Bowen Yang, Adam W. Tsen

Abstract

Active tuning of the spectral response within sensing materials is critical for application-specific optoelectronics. However, current approaches typically suffer from limited tunability, complex architectures, or sacrificed stability. Here we report an on-chip cation intercalation strategy that transforms the Kitaev-candidate Mott insulator α-ruthenium chloride (α-RuCl3) into a tetramethylammonium (TMA+)-intercalated RuCl3 layered superlattice. The intercalation-induced reconstruction of the Mott-derived electronic states substantially narrows the optical gap from ∼1.1 eV to ∼0.6 eV, extending the spectral response into the short-wave infrared (SWIR) regime. The introduction of an in situ van der Waals tunneling barrier suppresses dark current by >3 orders of magnitude and enhances specific detectivity by 4–6 orders of magnitude. By employing machine learning models, we demonstrate device-response-guided image processing for intelligent recognition under degraded environments. This work establishes a connection between correlated-electron systems and intelligent sensing, stimulating research directions at the intersection of quantum materials, optoelectronics, and intelligent sensing systems.

More from our Archive