DOI: 10.1021/acsnano.6c13060 ISSN: 1936-0851

Band-like Transport with Hall Mobility >70 cm2 V–1 s–1 in Stoichiometric Perovskite Crystals via Ion Confinement and Strain Relaxation

Dalin Li, Yuxin Li, Dong Liu, Bin Lu, Qian Chen, Lingzhen Wang, Hang Yin, Xinglong Ren, Junjie Zhang, Tao He

Abstract

Despite substantial progress in optoelectronic applications, lead–halide perovskites remain underperforming in field-effect transistors (FETs) due to multiphase instability, ion migration, and grain boundary scattering. Here, a dual-ion co-incorporation strategy was applied to CsxFA1–xPbI3–yBry single crystals. By systematically mapping a phase stability diagram, we pinpoint an optimal stoichiometry of Cs0.1FA0.9PbI2.7Br0.3 that integrates phase stability engineering with atomic-level ion confinement. Structural analysis reveals that 10% Cs+/Br– co-incorporation induces strain-relaxed lattice contraction (−1.23% along the a-axis relative to FAPbI3) and reinforces Pb–I bonds via octahedral distortion. This yields superior crystallinity (FWHM = 0.04°) and reduced I– migration, thereby enabling the investigation of FET and gated Hall effect carrier mobilities as functions of temperature. Consequently, champion two-terminal FET devices exhibit an electron mobility of 25.1 cm2 V–1 s–1 at room temperature, which increases to 126 cm2 V–1 s–1 at 120 K. Furthermore, high-resolution four-terminal measurements on a single crystal quantify and correct for contact-resistance effects, validating the relationship: Hall mobility (μHall) > linear regime mobility (μlin) > saturation regime mobility (μsat) with values of 89, 79.2, and 71.6 cm2 V–1 s–1, respectively. These findings collectively elucidate intrinsic band-like electron transport behavior in lead–halide perovskite single crystals, distinguishing it from hopping transport in organic semiconductors. By achieving a defect-minimized lattice, this compositional engineering paradigm overcomes the mobility bottleneck in perovskite FETs, facilitating the transition from photoelectronic applications to FET integration.

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