DOI: 10.1002/aelm.202300508 ISSN: 2199-160X

Analog HfxZr1‐xO2 Memristors with Tunable Linearity for Implementation in a Self‐Organizing Map Neural Network

Quanzhou Zhu, Biyi Jiang, Jun Lan, Zeyu Hou, Yida Dong, Zhongrui Wang, Xuewei Feng, Mei Shen, Hongyu Yu, Kai Chen, Jiamin Li, Longyang Lin, Feichi Zhou, Yida Li
  • Electronic, Optical and Magnetic Materials


Doped‐metal oxide‐based memristors, with the potential for improved switching performance and capability for multi‐bit information storage, are attractive candidates in the implementation of artificial neural network (ANN) hardware systems. However, performance and process considerations such as switching behavior and complementary‐metal‐oxide‐semiconductor (CMOS) process compatibility remain a challenge. This study shows that amorphous Zr‐doped HfO2 (HZO) memristors fabricated via a co‐sputtering approach improve the switching performance by providing a controllable knob to modulate defects in the switching layer. At the same time, it satisfies the CMOS process compatibility requirements for industry adoption. HZO memristors with optimized stoichiometry exhibit 30% reduced switching voltages and 50% faster switching as compared to control HfO2 memristors. Concurrently, this study shows that high linearity analog states tuning is achievable via a programming scheme that utilizes voltage pulses with increasing amplitudes. This study further shows via simulation evaluation that HZO memristors implemented in a self‐organizing‐map (SOM) network for Fashion MNIST database classification, achieve an accuracy of 92% with short training cycles. The results thus pave a potential pathway for further development of CMOS process compatible HZO memristors for use in future storage and computing applications.

More from our Archive