DOI: 10.1039/d3im00066d ISSN:
A new metallization method of modified tannic acid photoresist patterning
Zicheng Tang, Xubin Guo, Haihua Wang, Huan Chen, Wenbing KangA new process of in situ Ag fine pattern formation by direct pattern transfer of a modified tannic acid photoresist and in situ electroless plating in an Ag ion solution was reported.