800 °C open-air electrical characterization of III-N HEMTs using rapid dual-frequency extraction
Zihuan Liu, Yen-Chen Wang, Matti Thurston, Srabanti Chowdhury, Ruochen Lu, Neal HallThe deployment of active electronics in extreme environments—such as hypersonic combustion zones and deep supercritical geothermal wells—requires semiconductor devices capable of reliable operation at temperatures exceeding 500 °C. While III-Nitride (III-N) high electron mobility transistors (HEMTs) are theoretically suited for this regime, experimental validation in oxidizing atmospheres remains scarce, with most studies limited to vacuum or inert-gas environments. In this work, we report a new method for the electrical characterization of HEMTs up to 800 °C in an open-air environment. To overcome the challenges of thermal drift and measurement latency at these extremes, we introduce a rapid dual-frequency simultaneous extraction technique, which captures both transfer and output characteristics in a single sweep by modulating the gate and drain voltages at distinct frequencies. Our results demonstrate that the HEMT retains functional gate control, distinct saturation regions, and an on/off ratio exceeding 103 up to 700 °C, significantly outperforming commercial silicon depletion-mode FETs, which exhibited intrinsic carrier failure above 190 °C. Although permanent degradation was observed at 800 °C due to contact metallization failure, the demonstrated survivability up to 750 °C in air provides a critical existence proof for uncooled, non-hermetic electronics, directly supporting the objectives of the DARPA high operational temperature sensors program.