DOI: 10.1002/sdtp.16251 ISSN: 0097-966X
20.4: Activation of Doped Silicon Film Using Semiconductor Blue Light Diode Laser Annealing
Y. Yang, M. Kinoshita, T. Okuno, M. Hashizume, K. Saito, T. Sawai, J. Gotoh, S. Sugimoto- General Medicine
We have investigated activation annealing of the doped poly silicon film of LTPS TFT by using CW semiconductor blue light diode laser. It has been found that by full melting and re‐crystallization, the sheet resistance can be reduced significantly to 1/3 of which can be realized by using conventional RTA treatment. We will report the experiment results in the paper.