DOI: 10.1002/sdtp.16513 ISSN:
13‐2: Invited Paper: Advanced Patterning Method Exceeding a Limitation of Lithography with Resolution Enhancement Technology (RET)
Yoshisuke Toyama, Hirokazu Ikeda- General Medicine
Novel high resolution photolithography process is presented in this paper. New process and materials can use conventional exposure apparatuses with ghi‐line UV light to form high resolution pattern beyond the resolution limit of exposure apparatus.